• LETI INSPIRE WORKSHOP

  • EVG-LETI INSPIREWORKSHOP
    IMPRINT lithography : Introducing Game-Changing Technology for Sensing and Visual Devices
  • If optical lithography remains today’s hobby horse, industry is showing more and more interest for alternative versatile and high-performance technologies. UV flash imprint (NIL) at full wafer scale level is one of these promising alternatives, addressing the growing demand for technology applications such as photonic, bio and optical sensors, lighting, display, photovoltaic, among others.
    Leti and EV Group (EVG) have joint efforts in 2016 through INSPIRE, a joint program aiming to show the high potential for NIL technology. With EVG HERCULES production platform installed within Leti’s pilot line, a unique ecosystem has been built. Today’s goal is to develop the industrial infrastructure and produce printed prototype devices.
    This workshop offers a unique opportunity to learn more about NIL technology and how NIL can be envisioned into manufacturing processes.
  • TENTATIVE PROGRAM
     
    8h30 - Welcome and registration

    9h00 - EVG HERCULES platform : the industry-ready solution
    • EVG technology - M Wimplinger (EVG - Corporate Technology Development & IP Director)
    • The ecosystem environment of the HERCULES platform within LETI pilot line - H Teyssedre CEA-LETI - NIL program manager
    • The metrology and defectivity  challenges of imprint lithography - Paolo Parisi KLA - Application manager

    10h30-10h45 Break

    10h45 - The industry potential of NIL technology
    • EVG technology access at CEA-LETI - L. Pain (CEA-LETI - Patterning program manager)
    • How imprint lithography can efficiently serve sensing market
      • NIL for lightening application - H Teyssedre CEA-LETI - NIL program manager in partnership with with LETI start-up partner
      • NIL for SERS application - Stefan Landis CEA-LETI- IMAGINE program manager
    • The challenge of large scale master manufacturing
      • NIL for large surface patterning I - Badre Kerzabi - Sun Partner
      • NIL for large surface patterning II - M. Eibelhuber EVG NIL business

    12h30 - End network buffet
     
  • WHERE ?
     
    Minatec Campus
    Chrome 1
    3 Parvis Louis Néel
    Grenoble, France
  • WHEN ?
     
    Friday, June 30 9 am, 2017
     
    Inspire Workshop is a side event of the Leti Innovation Days : on June 28-29, 2017, Leti will celebrate its 50th anniversary during its Innovation Days in Grenoble, France.
  • FEES
     
    Full fee :  free of charge (pre-registration required for entrance)
  • Contact
     
  • About Leti
     
    Leti, a technology research institute at CEA Tech, is a global leader in miniaturization technologies enabling smart, energy-efficient and secure solutions for industry. Founded in 1967, Leti pioneers micro- and nanotechnologies, tailoring differentiating applicable solutions for global companies, SMEs and startups.
    Leti tackles critical challenges such as healthcare, energy and ICTs. From sensors to data processing and computing solutions, Leti’s multidisciplinary teams deliver solid expertise, leveraging world-class pre-industrialization facilities.
    With a staff of more than 1,900, a portfolio of 2,700 patents, 91,500 sq. ft. of cleanroom space and a clear IP policy, the institute is based in Grenoble, France, and has offices in Silicon Valley and Tokyo. Leti has launched 60 startups and is a member of the Carnot Institutes network.
    Contact us
     
    CEA / Leti
    17 rue des Martyrs
    38054 Grenoble cedex 9
    laurent.pain@cea.fr