• LETI IMAGINE WORKSHOP

  • Launching applications for MAPPER Maskless lithography
    Truly hardware based chip security
    200/300mm fab extension capability
  • The launch of massively parallel mask less lithography is without any doubt an attractive technological opportunity  for the manufacturing of innovative chips. In partnership with MAPPER Lithography BV, different EDA, track and resist suppliers, LETI has developed the full ecosystem that will support this technology.
    Now MAPPER production FLX1200 platform is on the path to its industrial ramp-up. Presenting an overview of the MAPPER Maskless environment, this workshop will also explain two launching applications: truly hardware based chip security and 200 / 300 mm fab extension.
  • TENTATIVE PROGRAM
     

    1:30 p.m. - Welcome
     
    2 p.m. - MAPPER technology deployment
    • MAPPER-LETI partnership history - L. Pain (CEA-LETI - Patterning program manager)
    • MAPPER technology status - B. J. Kampherbeek (MAPPER CEO)
    • The ecosystem environment of the MAPPER FLX1200 - S Landis (CEA-LETI - Maskless program manager)
    • The metrology challenges of the massively parallel Maskless lithography - Ronny Haupt - Technical Director KLA
    • Fab insertion readiness for E-beam lithography process integration - Charles Pieczulewski - Track System Ops., Office of Pres. - SCREEN

    4 p.m. - Coffee Break

    4:30 p.m. - MAPPER FLX1200 insertion
    • MAPPER technology access at CEA-LETI - L. Pain CEA-LETI - Patterning program manager
    • Chip security challenges and the opportunity of maskless technology
      • Andrew Wajs  CTO IRDETO
    • The use of Maskless lithography to support More than Moore heteregenous integration
      • Casper Juffermans  - Director Else Kooi Laboratory - TU Deft
    • The Maskless lithography opportunity for Chinese market
      • Yayi Wei - Professor Institut of Microelectronics of Chinese Academy Sciences

    6 p.m. - End of IMAGINE Workshop
  • WHERE ?
     
    Minatec Campus
    BCC Building 44
    3 Parvis Louis Néel
    Grenoble, France
  • WHEN ?
     
    Tuesday, June 27 2pm, 2017
     
    Imagine Workshop is a side event of the Leti Innovation Days : on June 28-29, 2017, Leti will celebrate its 50th anniversary during its Innovation Days in Grenoble, France.
  • FEES
     
    Full fee :  free of charge (pre-registration required for entrance)
    PLEASE REMEMBER TO HAVE A PASSPORT TO ENTER THE SITE
  • Contact
     
  • About Leti
     
    Leti, a technology research institute at CEA Tech, is a global leader in miniaturization technologies enabling smart, energy-efficient and secure solutions for industry. Founded in 1967, Leti pioneers micro- and nanotechnologies, tailoring differentiating applicable solutions for global companies, SMEs and startups.
    Leti tackles critical challenges such as healthcare, energy and ICTs. From sensors to data processing and computing solutions, Leti’s multidisciplinary teams deliver solid expertise, leveraging world-class pre-industrialization facilities.
    With a staff of more than 1,900, a portfolio of 2,700 patents, 91,500 sq. ft. of cleanroom space and a clear IP policy, the institute is based in Grenoble, France, and has offices in Silicon Valley and Tokyo. Leti has launched 60 startups and is a member of the Carnot Institutes network.
    Contact us
     
    CEA / Leti
    17 rue des Martyrs
    38054 Grenoble cedex 9
    laurent.pain@cea.fr